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Abhishek Jain | 1 Apr 2007 02:19
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Re: Vertical SU-8 walls

At that dose, I get cracks and my smallest feature sizes (15 to 25um wide
straight rectangular channel) are seen with a whitish spectrum unde a
microscope along with cracks.
 I thinkk I place the mask correctly. thanks
-Ab

On 3/31/07, Gareth Jenkins <gjenkins <at> f2s.com> wrote:
>
> Are your sure the print of your mask pattern is facing the wafer? If not
> this will introduce a gap the thickness of the mylar film which is
> enough to affect it.
> I have also just noticed your exposure dose of 700mJ/cm^2 is rather high
> for a 25um film. About 200mJ/cm^2 is recommended (more if you are using
> a filter).
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galindo818 | 1 Apr 2007 04:43
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aging affect of al etch

Can anyone please tell how to figuere out how to get the aging affect of al etch?
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David Thomson | 2 Apr 2007 00:33
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Polysilicon Deposition

Hi,

I need to get 4um of polysilicon deposited onto inch square SOI  
samples. I know that 4um is quite a lot to deposit so I am  
considering sputtering silicon on and then annealing to form the  
poly. Does anyone know of anywhere that can perform this task.

Cheers,

Dave
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Abhishek Jain | 2 Apr 2007 21:23
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Vertical epifluorescence microscopy

Hi
I was wondering if anyone knows of any set-up for doing 'vertical'
microscopy on a Nikon epifluorescence microscope. I am looking for
some kind of an L-bracket that can be mounted behind the objective to
do this. Along with this, I need to extend the raise the height of the
objective so that I can mount my sample on some kind of a vertical
stand and do some gravity field experiments. Please let me know if you
know some vendor where I can find these things.

thanks
-Abhishek Jain
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Peng Li | 3 Apr 2007 18:16
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Collimated UV light source

Dear friends,

Could you please recommend any vendor providing collimated UV light source?
Thanks!

Peng

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Nodes Norbert | 3 Apr 2007 19:03

Re: Vertical SU-8 walls

Is there any UV filter installed in the lamp house?

Exposure of SU-8 should not be done with UV light less than 340nm
wavelength.

Shorter wavelengths would create cracks in the resist layer and cause
problems regarding sidewall angle.

i-line exposure is recommended by resist vendor.

Best Regards, Norbert Nodes

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Gareth Jenkins | 3 Apr 2007 19:37

Re: Vertical SU-8 walls

Exposure with <340nm leads to negative sidewall slopes rather than 
postive which is the observed problem unless I misread it.
Abhishek, are the structures 30um at the top and 60um wide at the 
bottom? If it's the other way round (60 at the top, 30 at the bottom) 
then a filter could indeed be the answer.

Nodes Norbert wrote:
> Is there any UV filter installed in the lamp house?
>
> Exposure of SU-8 should not be done with UV light less than 340nm
> wavelength.
>
> Shorter wavelengths would create cracks in the resist layer and cause
> problems regarding sidewall angle.
>
> i-line exposure is recommended by resist vendor.
>
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Abhishek Jain | 3 Apr 2007 19:49
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Re: Vertical SU-8 walls

They are 50-60um at the bottom and 30um at the top, thus a positive slope!
thanks

On 4/3/07, Gareth Jenkins <gjenkins <at> f2s.com> wrote:
> Exposure with <340nm leads to negative sidewall slopes rather than
> postive which is the observed problem unless I misread it.
> Abhishek, are the structures 30um at the top and 60um wide at the
> bottom? If it's the other way round (60 at the top, 30 at the bottom)
> then a filter could indeed be the answer.
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mohammed ashraf | 4 Apr 2007 07:59
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RIE etching

Dear all

I need to etch AZ9260 structures which are on SU8 substrate. Can anyone 
suggest me a way to etch AZ9260 resist without affecting/etching SU8 in any 
way ?

Regards

Ashraf

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Petru Lunca Popa | 4 Apr 2007 08:12
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Removing PDMS from SIO2

Hi
I sticked some PDMS on a SIO2. Doesa anybody has any iddea how to remove it?
I tried with Chloroform and THF and didnt work. I dont want to polish
or do something which can possible destroy the Si oxide layer

Thanks
Petru Strasbourg
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Gmane