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is_bajpayee | 1 Nov 2006 07:06

TMAH ETCHING OF NICKEL

Dear friends

I have a peculiar problem of etching of Silicon using TMAH without at all affecting the patterned Nickel on oxide.
Nickel ( thermally evoporated for thickness of 800A) is patterened with PR and lithography on the SiO2/si,
etching of  the exopsed Si using TMAH  ( 10%wt, 80C) has to carried out. Now i would like to know that how the
Nickel film will be affected by this solution and what will be the characteristics of the the etching. i
tried the same with KOH  at room tempearture and there is negligible etching of nickel for a long time.

any suggestions will be highly appreciated. 

thank you

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Maria Nordström | 1 Nov 2006 07:23
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RE: coating a second layer of Su8...

Dear Vishwa,

You should consider the two layers as independent when you calculate spin speeds and exposure dosages.
I.e. for your second layer you need to find a spin recipe that will produce a 50 µm thick layer and bake +
expose accordingly. Otherwise, I think you will end up with a 350 µm thick structure...

Regards,

Maria

-----Original Message-----
From:	Vishwa [mailto:dagarshali <at> gmail.com]
Sent:	Sun 10/29/2006 5:07 PM
To:	General MEMS discussion
Cc:	
Subject:	[mems-talk] coating a second layer of Su8...
Hi Guys,

I am trying to make two layers of Su8-2100 on a  Si-Wafer.

The first layer is the base structure for the microchannel the
dimensions being 2.5mm x 150um x 5cm (W x H x L).

The second layer is of same width and length, the difference being the
height of microstructures, which is 50um.

The procedure that I currently follow is outlined below :-

- First spin the SU8 on the wafer and coat a 150um layer. Then do the
soft bake, expose, then do the post exposure bake and finally develop.
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Gareth Jenkins | 1 Nov 2006 16:11

Re: to get thin SU-8 film

I think you mean GBL rather than PGMEA? I have doubts as to whether a 
5-10nm layer is possible via spin-coating (I have never heard of anyone 
trying this).
The following thread may be useful:
http://mail.mems-exchange.org/pipermail/mems-talk/2006-January/139480.html

stefano.park <at> gmail.com wrote:
> Hi guys
>
> I would like to make 5-10 nm thickness of  SU-8 solution so that I am
> going to dilluted with PGMEA.
>
> What do you think the ratio bewteen SU8-2002 and PGMEA for the 5-10nm 
> thickness?

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Rajib Ahmed | 1 Nov 2006 16:50
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Flow sensor inquiry

Hello everyone,

We are trying to buy a digital flow sensor capable of sensing flows of 
25-40 mL/min.  The pipe ID is 1/4".  The pressure drop is about 0.25 
psi.  The oil is typically 30-60 centipoise oil.  Can you suggest some suitable flow sensors with some
pricing 
information?  Thanks a lot!

*******************************************************************************
Rajib Ahmed
347 Hopeman Engineering Building
Department of Electrical and Computer Engineering
University of Rochester
Rochester, NY 14627-0167
Email:rajib <at> ece.rochester.edu
Phone#:(585)224-6538
Fax#:(585)273-4919
*******************************************************************************

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Guangchi Archie Xuan | 1 Nov 2006 17:18
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Can someone show me an actual photo of a Mylar Beamsplitter

Maybe some of you have a FTIR spectrometer that could work in Far-IR region. I'm wondering whether you could
send me a photo showing the mylar beamsplitter. 

  I am trying to make one for my spectrometer but I have never seen a real one in the first place so I'm not sure
where mine went wrong. I used a stretched sheet of 25um, 50um and 75um thickness Mylar for our beamsplitter
but our Michelson interferometer couldn't get any interferogram. 

  So if you could show me a real one that'll be great! Also, any advice is warmly welcome.
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Xiaojing Zou | 1 Nov 2006 17:43
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How to clean single crystal TiO2 with chemicals?

Hi:

    Is there anybody having experience with wet etching single crystal TiO2 
substrate??? I want to etch the surface for half micron deep.  I tried H2SO4 
and HF, but it does not do the job. But as far as I know, acid will attach 
TiO2.

   I do not quite understand why it is so hard to etch single crystal 
materials??

Xiaojing 

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Andrea Mazzolari | 1 Nov 2006 19:56
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Corner compensation mask design

Hi all,
i want to realize bulk etching of a silicon wafer realizing this structure:
http://www.alientech.it/holes.gif
Silicon wafer is oriented (110), and white rectangles are holes into  
wafer, rotated of 2 degrees with respect to flat.
I'm planning to use a wet-etch.
I'm looking for tutorials wich well explain how to design corner  
compensation structures in order to have perfect corners on the (110)  
silicon wafer.
Could someone suggest me a good reading?
Is there a cad which, given in input a graphical file which containt  
desidered geometries, is able to automatically design compensation  
structure ?

Many thanks,
Andrea.

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weiyut | 1 Nov 2006 22:03
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PDMS/Ti bonding

Hi, All,

I have a question about PDMS/Ti bonding. Does anybody try to do the use
plasma treament on both pdms and Ti surface and then bind it? What is the
bonding strength?

Best

Wei-Yu

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Kris | 1 Nov 2006 22:51

Gold contaminated DRIE (Bosch) process for Si

Hello,

We are looking for a gold contaminated Bosch process
for deep Si etching. We would like to perform the DRIE
on a Si-pyrex bonded stack. There are large cavities
in the silicon wafer (3mmX9mmx200um) that are sealed
with the bonded pyrex wafer. The sidewalls on the Si
cavity, as well as the pyrex cap, have 0.5um of gold.

We would like to DRIE the backside of the Si (to a
depth of 120um) to open the enclosed trench area, with
a 1:25 etch aspect ratio. I would appreciate any
suggestions about any Bosch process service providers.

Thanks,
--Kris

K. Vossough, Ph.D.
Nano and Micro Technology Consultants
E-mail: vossough <at> memswork.net
Voice: (408)373-5413
Fax: (650)798-5001
http://www.memswork.net
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bh2247 | 1 Nov 2006 23:20
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How to prepare 2mM octadecanethiol without suspending particles

Hi all,

I am trying to prepare 2mM Octadecanethiol (sigma-aldrich cat#
O-1858) in ethanol. But there always are some suspending particles
in solution. Anyone ever used this chemical? Please give some
suggestions.

-/Bob
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Gmane