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Peter Svasek | 2 Oct 2006 13:27
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Re: Etching Ag

Hi,

we use a 40% solution of Fe(NO3)3 in water to etch Ag.

Regards
Peter

Benyimin Hadad wrote:

>Hello 
>
>I want to know if someone know how to etch Ag , dry and wet .
>

Vienna University of Technology
Institute of Sensor and Actuator Systems
Gusshausstrasse 27-29/366
A-1040 Vienna
Austria

Tel. +43-1-58801-36643
Fax  +43-1-58801-36699

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Hsiu-Jen Wang | 2 Oct 2006 18:00
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Re: Photoresist with smooth and high resolution sidewall

Isaac,

    Yes, the ripples on the sidewall actually made roughness. I used
AZ 9260, and tried post expose bake but haven't taken SEM, so I'm not
sure how it goes. By the way, I also would like to know sidewall of AZ
9260 in 4.7um thickness still be vertical? Or what photoresist should
I use for this thickness. Vertical and smooth sidewall are the most
important issues in my experiment. Thanks.

Regard,

Alton

On 9/29/06, Isaac Chan <iwchan <at> venus.uwaterloo.ca> wrote:
> Alton,
>
> Are you talking about the ripples on the sidewall caused by standing wave
> interference pattern, or the line edge roughness seen from the top due to
> the resist's molecular roughing/photomask pattern roughness?
>
> Regards,
> Isaac
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Feng-Yuan Zhang | 2 Oct 2006 19:46
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for electroplating informations

Hi,

I am looking for the companies for electroplating of copper, and 
other metals with designed pattern. Any information will greatly appreciated.

Best wishes,

Fengyuan

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RABBIA Laurent | 3 Oct 2006 09:25

Polymerisation of PDMS

Hello everybody,

Please, someone can tell me which is the  temperature and time for complete
polymerisation of PDMS ? I know there is many process on it but in your
opinion which is the best ? 

Reed you, Laurent.

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Bill Moffat | 3 Oct 2006 15:22

RE: Photoresist with smooth and high resolution sidewall

In case you do not get a suitable resist.  Contact me for information on
image reversal.  Any positive resist, side walls controllable from-22
degrees through vertical to +22 degrees.  I have worked with up to 40
micron thick resist.
Bill Moffat, CEO
Yield Engineering Systems, Inc.
2185 Oakland Rd., San Jose, CA  95131
(408) 954-8353

-----Original Message-----
From: mems-talk-bounces <at> memsnet.org
[mailto:mems-talk-bounces <at> memsnet.org] On Behalf Of Hsiu-Jen Wang
Sent: Friday, September 29, 2006 1:33 AM
To: mems-talk <at> memsnet.org
Subject: [mems-talk] Photoresist with smooth and high resolution
sidewall

Hi all,

    I'd like to obtain the information about which type of photoresist
has smooth and high resolution sidewall, whose thickness is 3um~5um.
Could anybody share his/her expeience? Appreciate a lot.

Alton Wang
University of Washington
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Isaac Chan | 3 Oct 2006 15:28
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Re: Photoresist with smooth and high resolution sidewall

Alton,

Yes, post-exposure bake, if done properly, should be able to completely
remove those ripples on the sidewall. Typically, the thinner the resist
you use, the more vertical the profile can be. I have not used AZ9260
personally, but I don't see any problem to get it vertical. If you are
using contact lithography, the gap between resist and photomask mainly
affect your profile. If you have hard bake step after development, your
hard bake temperature above 110C will start to reflow your resist and
change its profile.

Regards,

Isaac Chan, Ph.D.

On Mon, 2 Oct 2006, Hsiu-Jen Wang wrote:

> Isaac,
>
>     Yes, the ripples on the sidewall actually made roughness. I used
> AZ 9260, and tried post expose bake but haven't taken SEM, so I'm not
> sure how it goes. By the way, I also would like to know sidewall of AZ
> 9260 in 4.7um thickness still be vertical? Or what photoresist should
> I use for this thickness. Vertical and smooth sidewall are the most
> important issues in my experiment. Thanks.
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Gareth Jenkins | 3 Oct 2006 15:55

Re: Polymerisation of PDMS

It depends what you are trying to achieve but generally it is not too 
critical. The maximum is about 95C and takes one hour. I use 65C for 
about 3 hours (only because my moulding dishes cannot take 95C).
Apart from the curing time, the curing temperature will have some effect 
on the overall flexibility but not significantly (AFAIK) - this can be 
better controlled by adjusting the component ratio. I'm sure this will 
have been documented somewhere in the literature.

RABBIA Laurent wrote:
> Hello everybody,
>
> Please, someone can tell me which is the  temperature and time for complete
> polymerisation of PDMS ? I know there is many process on it but in your
> opinion which is the best ? 
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Barbara Cortese | 3 Oct 2006 18:34
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Re:Polymerisation of PDMS

Hi

try using an oven with 140°C for 15 minutes!

---------- Initial Header -----------

> Subject : [mems-talk] Polymerisation of PDMS

> Hello everybody,
> 
> Please, someone can tell me which is the  temperature and time for complete
> polymerisation of PDMS ? I know there is many process on it but in your
> opinion which is the best ? 
_______________________________________________
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Matthew Davies | 3 Oct 2006 18:35
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RE: Polymerisation of PDMS

60 deg C and 4 hours are the standard conditions I use.

Matt

University of Hertfordshire

-----Original Message-----
From: RABBIA Laurent [mailto:laurent.rabbia <at> recif.com] 
Sent: Tuesday, 3 October 2006 8:26 AM
To: 'mems-talk <at> memsnet.org'
Subject: [mems-talk] Polymerisation of PDMS

Hello everybody,

Please, someone can tell me which is the  temperature and time for complete
polymerisation of PDMS ? I know there is many process on it but in your
opinion which is the best ? 

Reed you, Laurent.

--

-- 
No virus found in this outgoing message.
Checked by AVG Free Edition.
Version: 7.1.407 / Virus Database: 268.12.12/461 - Release Date: 2/10/2006

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Vikrant A. Chaudhari | 3 Oct 2006 18:35
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Metal Paste for Screen Printing

hello

can any one suggest a manufacturer of metal paste for screen printing in
India

vikrant
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Gmane