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Alik Widge | 1 Jun 2003 18:10
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Re: PDMS residue imprint

I recall seeing one paper where PDMS microstamps were extracted overnight 
in chloroform to remove low molecular weight residues. I personally have 
not had the problem you describe, so I've never tried the extraction. You 
should expect, though, that it would cause swelling of your PDMS (as most 
organic solvents do), so if the PDMS is adhered to something already, I 
suspect it would delaminate due to the strain of the expansion.

Alik Widge
MEMS Laboratory
Carnegie Mellon University

--On Friday, May 30, 2003 4:02 PM -0500 Christopher Khoury 
<ckhoury <at> nanosphere-inc.com> wrote:

> Group,
>
> is anyone familiar with removing excess residues or uncured monomer from
> PDMS? A patterned imprint residue is highly noticable anytime PDMS comes
> in contact with glass in particular. Usually this imprint can be seen
> through side illumination or scattering off the glass. 	So far I've tried
> pulsed and unpulsed sonication of the PDMS mold in both water and dilute
> ethanol, this only seems to improve things marginally.
>
> Thanks,
>
> C. Khoury
>
>
> Christopher Khoury
> Microsystems Engineer
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George Steimle | 2 Jun 2003 15:21

Re: Parqit remover

Hello
Who supplies Parqit, we can not find any supplier of this product.

George Steimle
University of South Florida
Process Development Specialist
College of Marine Science
Center For Ocean Technology
727-553-3937
Fax: 727-553-3967
E-mail:gsteimle <at> marine.usf.edu
140 Seventh Avenue South
St. Petersburg, Florida 33701-5016
----- Original Message -----
From: <tetze <at> ieee.org>
To: <mems-talk <at> memsnet.org>
Sent: Friday, May 30, 2003 5:58 PM
Subject: [mems-talk] Parqit remover

> Hello.
> I am interested in using Parqit (a photocuring epoxy resin) on oxide films
(e.g. TiO2,
> SiO2 on Si), but wonder if there is any good remover for it.
> Has anyone tried anything for the remover?
> Thank you so much for your comment.
>
> Tetze Hamano
>
>
> _______________________________________________
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Abang Annuar Ehsan | 2 Jun 2003 12:09
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SU-8 refractive index variation

Dear all,

Is there any way that the refractive index of the SU-8 be altered, i.e 
during the baking/ curing stage? Some polymers do change their R.I's when 
subject to heating at different temperatures. A slight change in the index 
is an advantage. Usually, lower than 1%, prefably 0.4%. Is there anyone who 
has done any study on the refractive index variation of the SU-8? Your kind 
help is highly appreciated.

Abang Annuar Ehsan
Universiti Kebangsaan Malaysia

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Faid, Karim | 2 Jun 2003 16:28
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RE: PDMS residue imprint

Hi All:

There is a recent paper by Karin Glasmastar from Chalmers University in
Sweeden that investigated this problem. It is published in one of the most
recent edition of Langmuir (it is still under the asap category).
They indeed found that there is a lot of silicone transfer whenever PDMS is
contacted to a surface. They suggest that a UV-ozone treatment reduced this
transfer. We found in our work that leaving the  PDMS overnight in ethanol
allowed the leach out of most of the unreacted monomers and oligomers. A
better way was to use a soxhlet extraction in ethanol too.
Karim

-----Original Message-----
From: Alik Widge [mailto:alik <at> cs.cmu.edu]
Sent: Sunday, June 01, 2003 12:11 PM
To: General MEMS discussion
Subject: Re: [mems-talk] PDMS residue imprint

I recall seeing one paper where PDMS microstamps were extracted overnight 
in chloroform to remove low molecular weight residues. I personally have 
not had the problem you describe, so I've never tried the extraction. You 
should expect, though, that it would cause swelling of your PDMS (as most 
organic solvents do), so if the PDMS is adhered to something already, I 
suspect it would delaminate due to the strain of the expansion.

Alik Widge
MEMS Laboratory
Carnegie Mellon University

--On Friday, May 30, 2003 4:02 PM -0500 Christopher Khoury
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Eric Sanjuan | 2 Jun 2003 19:46

filter out 334nm from aligner

hello all,
    I'm looking for a material, preferably a 5" glass plate, that I can use to cut out <350nm wavelengths ( I
really only need to cut out the 334nm peak) from my aligner. Can anyone point me in some direction? I have
found a glass on Schott called wg320 which I could have an optical film put on to cut out the 334nm peak. Does
anyone know of a vendor that can provide this service for a small lot (one piece) at a reasonable price
(Melles Groit would charge in the 1000's)?
                                                                        thanks in advance,
                                                                                                                    eric 

 
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tetze | 2 Jun 2003 18:22
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Parqit supplier (Re: Parqit remover)

Hello there.
The Parqit supplier is Autex, inc. (http://www.parqit.com/e/eindex.html)
Any suggetion on the remover for epoxy resin are welcome.  Thanks.

Tetze "Sophie" Hamano
tetze <at> ieee.org

>From: "George Steimle" <gsteimle <at> seas.marine.usf.edu>
>Subject: Re: [mems-talk] Parqit remover
>Date: Mon, 2 Jun 2003 09:21:49 -0400
>
>Hello
>Who supplies Parqit, we can not find any supplier of this product.
>
>
>George Steimle
>----- Original Message -----
>> I am interested in using Parqit (a photocuring epoxy resin) on oxide films
>(e.g. TiO2,
>> SiO2 on Si), but wonder if there is any good remover for it.
>> Has anyone tried anything for the remover?
>> Thank you so much for your comment.
>>

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vamshi | 3 Jun 2003 00:16
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Bosch etch

Hai all,
I am trying to etch 2mm features to a depth of 200microns using Bosch process with an oxford plasma tool. I
read in some papers that the etch rate decreases having more silicon exposed. Is there a way i can increase
the etch rate without affecting the etch profile.
thanks
sincerely
Vamsi

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K.L.Zheng | 3 Jun 2003 06:35
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CrystalBond Stripper

Hello everybody:
       We used CrystalBondTM509 as the glue between quartz and silicon
during the anisotropic etching of silicon in 75°C KOH solution. After
about 2 hours anisotropic etching, most glue can be remove in acetone
which is protected. But, Some CrystalBond509 ,which is exposed to the
KOH solution, can’t be removed completely.  This residues are very
unwelcoming in the following process. 
Does anyone have experiences about the stripping of CrystalBond 509? Any
suggestion are appreciated.

=======================================
                     Mr. K.L.Zheng                            
 Dept. of Precision Machinery and Precision Instrumentation
 University of Science and Technology of China             
 Hefei, Anhui Province, 230027,  P.R.China                 
 E-Mail: zhengkl <at> mail.ustc.edu.cn <mailto:zhengkl <at> mail.ustc.edu.cn>

 Tel: +86-551-3607405  Fax: +86-551-3607504
=======================================

 
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Matteo Dainese | 2 Jun 2003 18:33
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EO - TO polymers

Dear all,
I'm looking for a polymer material
which, after spinning and curing, can survive
a plasma CVD deposition process at around
200-220 degrees. Not only! It should be possible afterwards
to change the refractive index of this polymer
either electro-optically or thermo-optically, as much as possible
to tune the optical behavior of the device.
Regarding the electro-optic coefficient,
I don't mind if the Curie temperature is below 200deg,
as long as it's possible to pole the material afterwards.
I don't know if anything like this exists, but, in case,
I would be grateful of any suggestion.

Regards
Matteo Dainese

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Pan Mao | 3 Jun 2003 05:41

PDMS by SEM

Dear all,

I have made the PDMS microfluidic channel and want to see the cross-
section of the channel by using SEM. However, it seems that I need to cut 
a very shrap surface of my interest. Is it required? I would like to know 
if any one has some experience on it. Your suggestions will be greatly 
appreciated.

Thanks a lot,

Pan Mao   

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Gmane