MEMS Express from MNX

MEMS Express from MNX

[mems-talk] EEG Devices and Sensors

Hello everyone,

I'm a new member here, I did not know however, my question had been
asked before.

Is there any or many devices or sensors that able to handle EEG for
full head reading? not only in some part of our head, but for the
whole head.

Thank you

--

-- 
Best regards,

Anton Siswo R.A.
-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*
Open Sources does not mean it's free like free as free
-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk

MEMS Express from MNX

MEMS Express from MNX

[mems-talk] UV 26-3.0

Dear all,

I'm currently using photoresists uv26. I need to reflow the resist. But I tried several temperature still
it couldn't hit the profile I want. At lower temperature like 165C the reflow is not enough; when I try to go
higher like 180C the resist burnt. 
Any comments or advice about this photoresists is very much welcomed.

Thank you in advance.

Best Regards,
Jocelyn

Sent from my iPhone
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk

MEMS Express from MNX

Re: [mems-talk] Resist thickness for nitride etch

Thanks Lou, I got that. 
The thing is that my Si wafer has a SiN layer on top of which 2 um resist acts a mask. I want to do a plasma(Oxford
endpoint RIE) etch exposed portions of SiN (and not Si beneath it). The exposed SiN layer is 400 nm thick and
consists of a series of 25 um squares. Overall, if the whole exposed SiN is etched, I should get a step depth
of 2.4 um on the profilometer. I etch for 130% of the required etch time to etch all 400 nm of nitride.
However, when I measure the step depth on profilometer, it always shows me that the depth is less than 2.4
um. I can't fathom the reason behind it. Could it be because my features are very small?

Thanks
Ahmad

----- Original Message -----
From: "Lou Chomas" <lchomas <at> hotmail.com>
To: "Ahmad M Haider" <ahaider3 <at> gatech.edu>
Sent: Thursday, May 9, 2013 12:00:18 AM
Subject: RE: [mems-talk] Resist thickness for nitride etch

Hi Ahmad,     If the layer under the nitride or resist that you are measuring is also etched (silicon, oxide,
etc.)  you will measure a step that is the etch through the material plus the etch into the substrate.  So, if
you etch just resist and then measure the thickness before and after, you will need to then strip the resist
and measure the amount of etch into the substrate and subtract it.
-Lou

> Date: Wed, 8 May 2013 23:33:17 -0400
> From: ahaider3 <at> gatech.edu
> To: mems-talk <at> memsnet.org; lchomas <at> hotmail.com
> Subject: Re: [mems-talk] Resist thickness for nitride etch
> 
> Hi Lou,
> 
> What do you mean by "Be careful to account for any etching into the substrate if you are using a profilometer
to measure the thickness." I use the dektak profilometer to measure the thickness in order to verify if the
RIE plasma etcher was able to remove all exposed silicon nitride.
> 
> Thanks,
> Ahmad
> 
> ----- Original Message -----
> From: "Lou Chomas" <lchomas <at> hotmail.com>
> To: "General MEMS discussion" <mems-talk <at> memsnet.org>
> Sent: Wednesday, May 8, 2013 5:09:30 PM
> Subject: Re: [mems-talk] Resist thickness for nitride etch
> 
> Ahmad,    That depends a lot on your process.  I would recommend putting some resist down with your pattern on a
test wafer and etching for some amount of time.  Pick something less than your total etch, but not too short. 
Measure the thickness of the resist before and after and then you can calculate whether the thickness will
be sufficient.  Be careful to account for any etching into the substrate if you are using a profilometer to
measure the thickness.  If your recipe has a lot of oxygen, the rate against the resist will likely be very high.
> -Lou
> > Date: Wed, 8 May 2013 16:29:49 -0400
> > From: ahaider3 <at> gatech.edu
> > To: mems-talk <at> memsnet.org
> > Subject: [mems-talk] Resist thickness for nitride etch
> > 
> > Hi
> > 
> > I am trying to do an anisotropic etch of 400 nm nitride layer in a RIE machine. A portion of the nitride is
protected by a resist layer on top of it. Can you tell approximate how much thickness of resist would I need
so that the resist doesn't get stripped off during the nitride etch? 
> > 
> > Thanks,
> > Ahmad
> > 
> > _______________________________________________
> > Hosted by the MEMS and Nanotechnology Exchange, the country's leading
> > provider of MEMS and Nanotechnology design and fabrication services.
> > Visit us at http://www.mems-exchange.org
> > 
> > Want to advertise to this community?  See http://www.memsnet.org
> > 
> > To unsubscribe:
> > http://mail.mems-exchange.org/mailman/listinfo/mems-talk
>  		 	   		  
> _______________________________________________
> Hosted by the MEMS and Nanotechnology Exchange, the country's leading
> provider of MEMS and Nanotechnology design and fabrication services.
> Visit us at http://www.mems-exchange.org
> 
> Want to advertise to this community?  See http://www.memsnet.org
> 
> To unsubscribe:
> http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> 
> -- 
> Ahmad Haider
> PhD Student, School of Mechanical Engineering
> Georgia Institute of Technology, Atlanta
 		 	   		  

--

-- 
Ahmad Haider
PhD Student, School of Mechanical Engineering
Georgia Institute of Technology, Atlanta
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk

[mems-talk] Properties of Ca modified Lead Titanate

Hello all,
I need to know the specific heat, thermal conductivity, density, young modulas and Poisson ratio of Ca
modified Lead Titanate for finite element analysis.
Any link/source to this kind of information will be greatly appreciated.
Thanks.
Muztoba
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk

Re: [mems-talk] electroform station

Hi Hong,
The wafer cathode holder is critical in electroforming. The contacts must
be sealed off from the plating solution to avoid being welded to your
wafer. Also, a current thief must be used to obtain uniformity. I can help
you with plating tools.

Regards,
Dave

David Roberts (Principal)
Silicon Valley Wafer Plating
Santa Clara, CA (408)469-3203
www.waferplating.com

> Dear All,
> I'm looking for an electroforming station that can prepare nickle mold for
> either hot-embossing or injection molding. Any information will be
> appreciated.
> Hong
>
>

_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk

[mems-talk] Resist thickness for nitride etch

Hi

I am trying to do an anisotropic etch of 400 nm nitride layer in a RIE machine. A portion of the nitride is
protected by a resist layer on top of it. Can you tell approximate how much thickness of resist would I need
so that the resist doesn't get stripped off during the nitride etch? 

Thanks,
Ahmad

_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk